ALD La-based oxides for Vt-tuning in high-k/metal gate stacks

Thumbnail
View/open
Metadata
Show full item record
Authors
Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Tois, E.; Delabie, Annelies; Ragnarsson, Lars-Ake; Yu, HongYu; Nyns, Laura; Adelmann, Christoph; Van Elshocht, Sven
Conference
Atomic Layer Deposition Applications 3 Atomic Layer Deposition Applications 3
Title
ALD La-based oxides for Vt-tuning in high-k/metal gate stacks
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections