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A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process
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Authors
Briggs, Basoene
;
Soethoudt, Job
;
Delabie, Annelies
;
Wilson, Chris
;
Tokei, Zsolt
;
Boemmels, Juergen
;
Devriendt, Katia
;
Sebaai, Farid
;
Lorant, Christophe
;
Hody, Hubert
Conference
Materials for Advanced Metallization Conference - MAM
Title
A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process
Publication type
Oral presentation
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