Publication:
A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process
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2058 since deposited on 2021-10-25
Acq. date: 2026-01-07
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Views
2058 since deposited on 2021-10-25
Acq. date: 2026-01-07
Citations