Publication:

A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process

Date

2018
Presentation
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dc.contributor.authorBriggs, Basoene
dc.contributor.authorSoethoudt, Job
dc.contributor.authorDelabie, Annelies
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDevriendt, Katia
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorHody, Hubert
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorHody, Hubert
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.date.accessioned2021-10-25T16:56:53Z
dc.date.available2021-10-25T16:56:53Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30328
dc.identifier.urlhttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate18/03/2018
dc.source.conferencelocationMilano Italy
dc.title

A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process

dc.typeOral presentation
dspace.entity.typePublication
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