Browsing by author "Delabie, Annelies"
Now showing items 21-40 of 356
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ALD La2O3 cap layers on high-k gates to modify the metal gate work function
Maes, Jan; Swerts, Johan; Tois, E.; Delabie, Annelies; Adelmann, Christoph; Ragnarsson, Lars-Ake; Yu, HongYu (2007) -
ALD of Al2O3 for carbon nanotube vertical interconnect and its impact on the electrical properties
Chiodarelli, Nicolo; Delabie, Annelies; Masahito, Sugiura; Kashiwagi, Yusaku; Richard, Olivier; Bender, Hugo; Cott, Daire; Heyns, Marc; De Gendt, Stefan; Groeseneken, Guido; Vereecken, Philippe (2011) -
ALD on high mobility channels: engineering the proper gate stack passivation
Sioncke, Sonja; Lin, Hang Chun; Adelmann, Christoph; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Franquet, Alexis; Caymax, Matty; Meuris, Marc; Struyf, Herbert; De Gendt, Stefan; Heyns, Marc; Fleischmann, Claudia; Temst, K.; Vantomme, Andre; Muller, Matthias; Kolbe, Michael; Beckhoff, Burkhard; Schmeisser, Dieter; Tallarida, Massimo (2010) -
ALD on high mobility channels: engineering the proper gate stack passivation
Sioncke, Sonja; Lin, Dennis; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Caymax, Matty; Meuris, Marc; Struyf, Herbert; De Gendt, Stefan; Heyns, Marc; Fleischmann, Claudia; Temst, Kristiaan; Vantomme, Andre; Beckhoff, Burkhard (2010) -
Alkanethiolate Self-Assembled Monolayers on Cu: a Density Functional Theory Study of Formation and Phase Behavior
Clerix, Jan-Willem; Sanz-Matias, Ana; Armini, Silvia; Harvey, Jeremy; Delabie, Annelies (2019) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; van Bael, M.K.; Blomberg, T.; Pieereux, D.; Swerts, J.; Maes, J.W.; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2008) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; Van Bael, Marlies; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2009) -
Aluminium oxide atomic layer deposition on semiconductor substrates
Delabie, Annelies; Sioncke, Sonja; Rip, Jens; Van Elshocht, Sven; Pourtois, Geoffrey; Mueller, Matthias; Beckhoff, Burkhard; Pierloot, Kristine (2011) -
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
Van Dongen, Kaat; Nye, Rachel; Clerix, Jan-Willem; Sixt, Claudia; De Simone, Danilo; Delabie, Annelies (2023) -
Area selective atomic layer deposition of molybdenum films on nanoscale metal and metal nitride patterns
Lee, Se-Won; Kim, Moo-Sung; Lee, Changwon; Ivanov, Sergei; Delabie, Annelies; van der Veen, Marleen (2020) -
Area selective atomic layer deposition: a bottom-up approach for patterning
Delabie, Annelies; Soethoudt, Job; Tomczak, Yoann; Briggs, Basoene; Chan, BT; Tokei, Zsolt; Van Elshocht, Sven; Altamirano Sanchez, Efrain; Stevens, Eric; Parsons, Gregory, N (2018) -
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon
Stevens, Eric; Tomczak, Yoann; Chan, BT; Altamirano Sanchez, Efrain; Parsons, Gregory; Delabie, Annelies (2018) -
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures
Stevens, Eric; Tomczak, Yoann; Chan, BT; Altamirano Sanchez, Efrain; Parsons, Gregory; Delabie, Annelies (2018) -
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon
Stevens, Eric; Tomczak, Yoann; Chan, BT; Altamirano Sanchez, Efrain; Parsons, Gregory; Delabie, Annelies (2018) -
Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion
Grillo, Fabio; Soethoudt, Job; Marques, Esteban; de Martin, Lilian; Van Dongen, Kaat; van Ommen, J. Ruud; Delabie, Annelies (2020) -
Area-selective deposition on nanoscale metal/dielectric patterns by surface-dependent dimethylamino-trimethylsilane reaction
Soethoudt, Job; Tomczak, Yoann; Delabie, Annelies (2019) -
Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applications
Groven, Benjamin; Tomczak, Yoann; Nalin Mehta, Ankit; Bender, Hugo; Zhang, Haodong; Schram, Tom; Smets, Quentin; Heyns, Marc; Caymax, Matty; Radu, Iuliana; Delabie, Annelies (2018) -
Atomic imaging of nucleation of trimethylaluminium on clean H2O functionalized Ge(100) surfaces
Lee, Joon Sung; Kaufman-Osborn, Tobin; Melitz, Wilhelm; Lee, Sangyeob; Delabie, Annelies; Sioncke, Sonja; Caymax, Matty; Pourtois, Geoffrey; Kummel, Andrew C. (2011) -
Atomic layer deposition and remote plasma surface preparation for gate stack applications
Delabie, Annelies; Caymax, Matty; Brijs, Bert; Cartier, E.; Geenen, Luc; Vandervorst, Wilfried; Bajolet, Philippe; Maes, Jan; Tsai, Wilman; De Gendt, Stefan; Heyns, Marc (2003) -
Atomic Layer Deposition and the importance of surface preparation
Delabie, Annelies (2013)