Area selective atomic layer deposition: a bottom-up approach for patterning

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Authors
Delabie, Annelies; Soethoudt, Job; Tomczak, Yoann; Briggs, Basoene; Chan, BT; Tokei, Zsolt; Van Elshocht, Sven; Altamirano Sanchez, Efrain; Stevens, Eric; Parsons, Gregory, N
Conference
Materials for Advanced Metallization Conference - MAM
Title
Area selective atomic layer deposition: a bottom-up approach for patterning
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Meeting abstract
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