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Conference contributions
Area selective atomic layer deposition: a bottom-up approach for patterning
Publication:
Area selective atomic layer deposition: a bottom-up approach for patterning
Date
2018
Meeting abstract
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Soethoudt, Job
;
Tomczak, Yoann
;
Briggs, Basoene
;
Chan, BT
;
Tokei, Zsolt
;
Van Elshocht, Sven
;
Altamirano Sanchez, Efrain
;
Stevens, Eric
;
Parsons, Gregory, N
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Abstract
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1996
since deposited on 2021-10-25
1
last week
Acq. date: 2025-10-29
Citations
Metrics
Views
1996
since deposited on 2021-10-25
1
last week
Acq. date: 2025-10-29
Citations