Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Area selective atomic layer deposition: a bottom-up approach for patterning
Publication:
Area selective atomic layer deposition: a bottom-up approach for patterning
Copy permalink
Date
2018
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Delabie, Annelies
;
Soethoudt, Job
;
Tomczak, Yoann
;
Briggs, Basoene
;
Chan, BT
;
Tokei, Zsolt
;
Van Elshocht, Sven
;
Altamirano Sanchez, Efrain
;
Stevens, Eric
;
Parsons, Gregory, N
Journal
Abstract
Description
Metrics
Views
1996
since deposited on 2021-10-25
Acq. date: 2025-12-15
Citations
Metrics
Views
1996
since deposited on 2021-10-25
Acq. date: 2025-12-15
Citations