Publication:

Area selective atomic layer deposition: a bottom-up approach for patterning

Date

2018
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorBriggs, Basoene
dc.contributor.authorChan, BT
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorStevens, Eric
dc.contributor.authorParsons, Gregory, N
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-25T17:59:27Z
dc.date.available2021-10-25T17:59:27Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30586
dc.identifier.urlhttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf
dc.source.beginpage02K
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate18/03/2018
dc.source.conferencelocationMilan Italy
dc.title

Area selective atomic layer deposition: a bottom-up approach for patterning

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions