Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures

Thumbnail
Metadata
Show full item record
Authors
Stevens, Eric; Tomczak, Yoann; Chan, BT; Altamirano Sanchez, Efrain; Parsons, Gregory; Delabie, Annelies
Conference
18th International Conference on Atomic Layer Deposition-ALD. Featuring the 5th International Atomic Layer Etching Workshop
Title
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 nanometer Si3N4/amorphous carbon structures
Publication type
Meeting abstract
Collections