ALD La2O3 cap layers on high-k gates to modify the metal gate work function

Thumbnail
Metadata
Show full item record
Authors
Maes, Jan; Swerts, Johan; Tois, E.; Delabie, Annelies; Adelmann, Christoph; Ragnarsson, Lars-Ake; Yu, HongYu
Conference
AVS Topical Conference on Atomic Layer Deposition - ALD
Title
ALD La2O3 cap layers on high-k gates to modify the metal gate work function
Publication type
Proceedings paper
Collections