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Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon
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Authors
Stevens, Eric
;
Tomczak, Yoann
;
Chan, BT
;
Altamirano Sanchez, Efrain
;
Parsons, Gregory
;
Delabie, Annelies
ISSN
0897-4756
Issue
10
Journal
Chemistry of Materials
Volume
30
Title
Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon
Publication type
Journal article
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