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Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon
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1950 since deposited on 2021-10-26
1last week
Acq. date: 2025-10-29
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Metrics
Views
1950 since deposited on 2021-10-26
1last week
Acq. date: 2025-10-29
Citations