Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon

Publication:

2018

Journal article

Author(s)

Stevens, Eric

;

;

;

;

Parsons, Gregory

;

Chemistry of Materials

1958 since deposited on 2021-10-26

Acq. date: 2026-04-05