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Conference contributions
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Publication:
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
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Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Heyns, Marc
;
Beckx, Stephan
;
Caymax, Matty
;
Claes, Martine
;
De Gendt, Stefan
;
Degraeve, Robin
;
Delabie, Annelies
;
Deweerd, Wim
;
Groeseneken, Guido
;
Hooker, Jacob
;
Houssa, Michel
;
Kwak, Dong Hwa
;
Lander, Rob
;
Lujan, Guilherme
;
Maes, Jan
;
Niwa, Masaaki
;
Pantisano, Luigi
;
Puurunen, R.
;
Ragnarsson, Lars-Ake
;
Rohr, Erika
;
Schram, Tom
;
Van Elshocht, Sven
;
Vandervorst, Wilfried
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1965
since deposited on 2021-10-15
1
last month
Acq. date: 2026-02-25
Citations
Statistics
Views
1965
since deposited on 2021-10-15
1
last month
Acq. date: 2026-02-25
Citations