dc.contributor.author | Thakare, Devesh | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Philipsen, Vicky | |
dc.date.accessioned | 2024-03-18T13:00:27Z | |
dc.date.available | 2023-10-07T17:32:42Z | |
dc.date.available | 2024-03-18T13:00:27Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 2590-0072 | |
dc.identifier.other | WOS:001069211300001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42662.2 | |
dc.source | WOS | |
dc.title | Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective | |
dc.type | Journal article | |
dc.contributor.imecauthor | Thakare, Devesh | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.orcidimec | Thakare, Devesh::0000-0003-3265-7042 | |
dc.contributor.orcidimec | de Marneffe, Jean-Francois::0000-0001-5178-6670 | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.date.embargo | 2023-09-30 | |
dc.identifier.doi | 10.1016/j.mne.2023.100223 | |
dc.source.numberofpages | 21 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art.10223 | |
dc.source.endpage | N/A | |
dc.source.journal | MICRO AND NANO ENGINEERING | |
dc.source.issue | September | |
dc.source.volume | 20 | |
imec.availability | Published - open access | |