Authors
Stortelder, Jetske;
Ebeling, Robert P.;
Rijnsent, Corne;
van Putten, Michel;
de Rooij-Lohmann, Veronique;
Smit, Maximilian;
Storm, Arnold J.;
Koster, Norbert;
Lensen, Henk A.;
Philipsen, Vicky;
Opsomer, Karl;
Thakare, Devesh;
Feigl, Torsten;
Naujok, Philipp
EISBN
978-1-5106-4553-0
ISBN
978-1-5106-4552-3
ISSN
0277-786X
Conference
International Conference on Extreme Ultraviolet Lithography
Journal
Proceedings of SPIE
Volume
11854
Research discipline
Materials science
Title
First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
Publication type
Proceedings paper