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Mask absorber for next generation EUV lithography

dc.contributor.authorWu, Meiyi
dc.contributor.authorThakare, Devesh
dc.contributor.authorDe Marneffe, Jean-Francois
dc.contributor.authorJaenen, Patrick
dc.contributor.authorSouriau, Laurent
dc.contributor.authorOpsomer, Karl
dc.contributor.authorSoulie, Jean-Philippe
dc.contributor.authorErdmann, Andreas
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorNaujok, Philipp
dc.contributor.authorFoltin, Markus
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorSaadeh, Qais
dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2022-01-18T10:39:57Z
dc.date.available2021-11-02T16:03:40Z
dc.date.available2022-01-18T10:39:57Z
dc.date.issued2020
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000632585900001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38081.2
dc.sourceWOS
dc.titleMask absorber for next generation EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorWu, Meiyi
dc.contributor.imecauthorThakare, Devesh
dc.contributor.imecauthorDe Marneffe, Jean-Francois
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorSoulie, Jean-Philippe
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.contributor.orcidimecSoulie, Jean-Philippe::0000-0002-5956-6485
dc.identifier.doi10.1117/12.2572114
dc.identifier.eisbn978-1-5106-3843-3
dc.source.numberofpages15
dc.source.peerreviewyes
dc.source.conferenceConference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 21-25, 2020
dc.source.conferencelocationMonterey, CA, USA
dc.source.journalProceedings of SPIE
dc.source.volume11517
imec.availabilityPublished - imec


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220.500.12860/38081.2*2022-01-18T10:39:00Zvalidation by library/open access desk
120.500.12860/380812021-11-02T16:03:40Z

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