Browsing by author "Wu, Meiyi"
Now showing items 1-13 of 13
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Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Wu, Meiyi; de Marneffe, Jean-Francois; Opsomer, Karl; Detavernier, Christophe; Delabie, Annelies; Naujok, Philipp; Caner, Oezge; Goodyear, Andy; Cooke, Mike; Saadeh, Qais; Soltwisch, Victor; Scholze, Frank; Philipsen, Vicky (2021) -
Determination of optical constants of thin films in the EUV
Ciesielski, Richard; Saadeh, Qais; Philipsen, Vicky; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Naujok, Philipp; van de Kruijs, Robbert W. E.; Detavernier, Christophe; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2022) -
Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Detavernier, Christophe; Naujok, Philipp; Saadeh, Qais; Soltwisch, Victor; Delabie, Annelies; Philipsen, Vicky (2022) -
Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Saadeh, Qais; Soltwisch, Victor; Naujok, Philipp; Detavernier, Christophe; Dattilo, Davide; Foltin, Markus; Goodyear, Andy; Cooke, Mike; Delabie, Annelies; Philipsen, Vicky (2023) -
High NA EUV lithography simulation using new calibrated mask model
Wu, Meiyi; Makhotkin, Igor; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Saadeh, Qais; Naujok, Philipp; Wu, Meiyi; Philipsen, Vicky; Thakare, Devesh; Scholze, Frank; Buchholz, Christian; Stadelhoff, Christian; Wiesner, Thomas; Soltwisch, Victor (2022) -
On the optical constants of cobalt in the M-absorption edge region
Saadeh, Qais; Naujok, Philipp; Thakare, Devesh; Wu, Meiyi; Philipsen, Vicky; Scholze, Frank; Buchholz, Christian; Salami, Zanyar; Abdulhadi, Yasser; Garcia, Danilo Ocana; Mentzel, Heiko; Babuschkin, Anja; Laubis, Christian; Soltwisch, Victor (2023) -
Optical constants for EUV scatterometry
Ciesielski, Richard; Saadeh, Qais; Naujok, Philipp; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Philipsen, Vicky; Van de Kruijs, Robbert; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2021) -
Refined extreme ultraviolet mask stack model
Makhotkin, Igor; Wu, Meiyi; Soltwisch, V.; Scholze, F.; Philipsen, Vicky (2021) -
Study of novel EUVL mask absorber candidates
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2021) -
The refined EUVL mask model
Makhotkin, Igor; Wu, Meiyi; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet
Saadeh, Qais; Philipsen, Vicky; Thakare, Devesh; Naujok, Philipp; Wu, Meiyi; Scholze, Frank; Buchholz, Christian; Tagbo-fotso, Claudia; Babalik, Ayhan; Kupper, Bettina; Soltwisch, Victor (2023)