Browsing by author "Soltwisch, Victor"
Now showing items 1-20 of 25
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Actinic characterization of EUV photomasks by EUV scatterometry
Scholze, Frank; Soltwisch, Victor; Ullrich, A.; Philipsen, Vicky; Burger, Sven (2015) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Wu, Meiyi; de Marneffe, Jean-Francois; Opsomer, Karl; Detavernier, Christophe; Delabie, Annelies; Naujok, Philipp; Caner, Oezge; Goodyear, Andy; Cooke, Mike; Saadeh, Qais; Soltwisch, Victor; Scholze, Frank; Philipsen, Vicky (2021) -
Determination of optical constants of thin films in the EUV
Ciesielski, Richard; Saadeh, Qais; Philipsen, Vicky; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Naujok, Philipp; van de Kruijs, Robbert W. E.; Detavernier, Christophe; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2022) -
Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Detavernier, Christophe; Naujok, Philipp; Saadeh, Qais; Soltwisch, Victor; Delabie, Annelies; Philipsen, Vicky (2022) -
Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Saadeh, Qais; Soltwisch, Victor; Naujok, Philipp; Detavernier, Christophe; Dattilo, Davide; Foltin, Markus; Goodyear, Andy; Cooke, Mike; Delabie, Annelies; Philipsen, Vicky (2023) -
High NA EUV lithography simulation using new calibrated mask model
Wu, Meiyi; Makhotkin, Igor; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
Imaging impact of multilayer tuning in EUV masks, experimental validation
Philipsen, Vicky; Hendrickx, Eric; Verduijn, Erik; Raghunathan, Sudhar; Wood, Obert; Soltwisch, Victor; Scholze, Frank; Davydova, Natalia; Mangat, Pawitter (2014) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014) -
Mask absorber development to enable next-generation EUVL
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hoenicke, Philipp; Soltwisch, Victor; Hendrickx, Eric (2019) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Saadeh, Qais; Naujok, Philipp; Wu, Meiyi; Philipsen, Vicky; Thakare, Devesh; Scholze, Frank; Buchholz, Christian; Stadelhoff, Christian; Wiesner, Thomas; Soltwisch, Victor (2022) -
On the optical constants of cobalt in the M-absorption edge region
Saadeh, Qais; Naujok, Philipp; Thakare, Devesh; Wu, Meiyi; Philipsen, Vicky; Scholze, Frank; Buchholz, Christian; Salami, Zanyar; Abdulhadi, Yasser; Garcia, Danilo Ocana; Mentzel, Heiko; Babuschkin, Anja; Laubis, Christian; Soltwisch, Victor (2023) -
Optical constants for EUV scatterometry
Ciesielski, Richard; Saadeh, Qais; Naujok, Philipp; Opsomer, Karl; Soulie, Jean-Philippe; Wu, Meiyi; Philipsen, Vicky; Van de Kruijs, Robbert; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2021) -
Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Abbasirad, Najmeh; Saadeh, Qais; Ciesielski, Richard; Gottwald, Alexander; Philipsen, Vicky; Makhotkin, Igor; Sokolov, Andrey; Kolbe, Michael; Scholze, Frank; Soltwisch, Victor (2023) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Ciesielski, Richard; Lohr, Leonhard M.; Mertens, Hans; Charley, Anne-Laure; de Ruyter, Rudi; Bogdanowicz, Janusz; Hoenicke, Philipp; Abbasirad, Najmeh; Soltwisch, Victor (2023) -
Simulation of polychromatic effects in high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Saadeh, Qais; Soltwisch, Victor; Bihr, Simon; Zimmermann, Joerg; Philipsen, Vicky (2021) -
Simultaneous Dimensional and Analytical Characterization of Ordered Nanostructures
Hoenicke, Philipp; Kayser, Yves; Nikolaev, Konstantin, V; Soltwisch, Victor; Scheerder, Jeroen; Fleischmann, Claudia; Siefke, Thomas; Andrle, Anna; Gwalt, Grzegorz; Siewert, Frank; Davis, Jeffrey; Huth, Martin; Veloso, Anabela; Loo, Roger; Skroblin, Dieter; Steinert, Michael; Undisz, Andreas; Rettenmayr, Markus; Beckhoff, Burkhard (2022) -
Small target compatible dimensional and analytical metrology for semiconductor nanostructures using X-ray fluorescence techniques
Hoenicke, Philipp; Kayser, Yves; Soltwisch, Victor; Waehlish, Andre; Wauschkuhn, Nils; Scheerder, Jeroen; Fleischmann, Claudia; Bogdanowicz, Janusz; Charley, Anne-Laure; Veloso, Anabela; Loo, Roger; Mertens, Hans; Hikavyy, Andriy; Siefke, Thomas; Andrle, Anna; Gwalt, Grzegorz; Siewert, Frank; Ciesielski, Richard; Beckhoff, Burkhard (2023)