Browsing by author "Klostermann, Ulrich"
Now showing items 1-10 of 10
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Application of an inverse Mack model for negative tone development simulation
Gao, Weimin; Klostermann, Ulrich; Mülders, Thomas; Schmoeller, Thomas; Demmerle, Wolfgang; De Bisschop, Peter; Bekaert, Joost (2011) -
Calibration and verification of a stochastic model for EUV resist
Gao, Weimin; Philippou, Alexander; Klostermann, Ulrich; Siebert, Joachim; Philipsen, Vicky; Hendrickx, Eric; Vandeweyer, Tom; Jonckheere, Rik (2012) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, Ulrich; Mülders, Thomas; Ponomarenco, Denis; Schmoeller, Thomas; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
Experimental characterization of NTD rResist shrinkage
Kuchler, Bernd; Mulders, Thomas; Taoka, Hironobu; Gao, Weimin; Klostermann, Ulrich; Kamimura, Sou; Grozev, Grozdan; Masahiro, Yoshidome; Shirakawa, Michihiro; Li, Waikin (2017) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Experimental validation of stochastic modeling for negative-tone develop EUV resist
Kamohara, Itaru; Gao, Weimin; Klostermann, Ulrich; Schmöller, Thomas; Demmerle, Wolfgang; Lucas, Kevin; De Simone, Danilo; Hendrickx, Eric; Vandenberghe, Geert (2015) -
Impact of EUV off-axis illumination on full field imaging performance for NXE:3100
Philipsen, Vicky; Hendrickx, Eric; Philippou, Alexander; Klostermann, Ulrich; Gao, Weimin (2011) -
Impact of mask three dimensional effects on resist-model calibration
De Bisschop, Peter; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Biafore, John; Robertson, Stewart A.; Smith, Mark (2009) -
Prediction of EUV stochastic microbridge probabilities by lithography simulations
Verduijn, Erik; Welling, Ulrich; Tang, Jiuzhou; Stock, Hans-Jurgen; Klostermann, Ulrich; Demmerle, Wolfgang; De Bisschop, Peter (2020) -
Source-mask optimization incorporating a physical resist model and manufacturability constraints
Mulders, Thomas; Domnenko, Vitaliy; Kuechler, Bernd; Stock, Hans-Juergen; Klostermann, Ulrich; De Bisschop, Peter (2012)