Browsing by author "Ordynskyy, Vladimir"

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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Vladimir; Jonckheere, Rik; Philipsen, Vicky; Schätz, Thomas; Sommer, Karl (2002)
Reliable sub-nanometer repeatability for CD metrology in a reticle production environment

Hourd, Andrew; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Döbereiner, Stefan; Hillmann, Frank; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson; Jonckheere, Rik; Philipsen, Vicky; Hartmann, Hans; Ordynskyy, Vladimir; Peter, Kai; Schätz, Thomas; Sommer, Karl (2002-12)