Now showing items 1-2 of 2

    • Introducing 193 nm lithography 

      Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998)
    • Lithographic performance of 193 nm single and bi-layer materials 

      Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998)