Lithographic performance of 193 nm single and bi-layer materials

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Author(s)

Goethals, Mieke

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Pollers, Ingrid

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Van Roey, Frieda

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Sugihara, Takashi

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Van Driessche, Veerle

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Tzviatkov, Plamen

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Steinhausler, T.

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Journal

Journal of Photopolymer Science and Technology

Metrics

1990 since deposited on 2021-09-30

1last month

Acq. date: 2025-12-09