Lithographic performance of 193 nm single and bi-layer materials

Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R.

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Lithographic performance of 193 nm single and bi-layer materials

Date

1998

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Van Driessche, Veerle

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Journal of Photopolymer Science and Technology

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Acq. date: 2026-01-06

Lithographic performance of 193 nm single and bi-layer materials

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