Publication:

Lithographic performance of 193 nm single and bi-layer materials

Date

1998
Journal article
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorSugihara, Takashi
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorMedina, A.
dc.contributor.authorGabor, A.
dc.contributor.authorBlakeney, A.
dc.contributor.authorSteinhausler, T.
dc.contributor.authorBiafore, J.
dc.contributor.authorSlater, S.
dc.contributor.authorNalamasu, O.
dc.contributor.authorHoulihan, F.
dc.contributor.authorKometani, J.
dc.contributor.authorTimko, A.
dc.contributor.authorCirelli, R.
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.accessioned2021-09-30T12:00:54Z
dc.date.available2021-09-30T12:00:54Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2588
dc.source.beginpage513
dc.source.endpage23
dc.source.issue3
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume11
dc.title

Lithographic performance of 193 nm single and bi-layer materials

dc.typeJournal article
dspace.entity.typePublication
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