Browsing by author "Dietze, Uwe"
Now showing items 1-6 of 6
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Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart (2011) -
Effective solutions for in-fab EUVL mask cleaning
Wähler, Tobias; Singh, Sherjang; Dietze, Uwe; Jonckheere, Rik; Baudemprez, Bart (2010) -
Integrated cleaning and handling automation of NXE3100 reticles
Jonckheere, Rik; Waehler, Tobias; Baudemprez, Bart; Dietze, Uwe; Dress, Peter; Brux, Oliver; Ronse, Kurt (2012) -
Optimization of EUV reticle cleaning by evaluation of chemistries on wafer-based mimic test structures.
Pacco, Antoine; Dattilo, Davide; Jonckheere, Rik; Rip, Jens; Dietze, Uwe; Kruemberg, Jens; Holsteyns, Frank (2016) -
Preserving printed wafer CD stability in high-frequency EUVL mask cleaning
Wähler, Tobias; Singh, Sherjang; Dietze, Uwe; Jonckheere, Rik; Ronse, Kurt; Baudemprez, Bart (2011) -
Techniques for removal of contamination from EUVL mask without surface damage
Singh, Sherjang; Chen, Ssuwei; Wähler, Tobias; Jonckheere, Rik; Liang, Ted; Chen, Robert J.; Dietze, Uwe (2010)