Now showing items 1-3 of 3

    • Dependence of EUV mask printing performance on blank architecture 

      Jonckheere, Rik; Hyun, Yoonsuk; Iwamoto, Fumio; Baudemprez, Bart; Hermans, Jan; Lorusso, Gian; Pollentier, Ivan; Goethals, Mieke; Ronse, Kurt (2008-03)
    • EUV contact holes and pillars pattering 

      Park, Sarohan; De Simone, Danilo; Tao, Zheng; Vandenberghe, Geert; Hyun, Yoonsuk; Kim, Seo-Min; Lim, Chang-Moon (2015)
    • Implementing full field EUV lithography using the ADT 

      Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008)