Now showing items 1-2 of 2

    • Novel process to pattern selectively dual dielectric capping layers using soft-mask only 

      Schram, Tom; Kubicek, Stefan; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Shou-Zen; Chang, V.S.; Mitsuhashi, Riichiru; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.C.; Paraschiv, Vasile; Vos, Rita; Sebaai, Farid; Ercken, Monique; Kelkar, Prasad; Delabie, Annelies; Adelmann, Christoph; Witters, Thomas; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kauerauf, Thomas; De Meyer, Kristin; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2008)
    • Quantitative prediction of junction leakage in bulk-technology CMOS devices 

      Duffy, R.; Heringa, A.; Venezia, V.C.; Loo, Josine; Verheijen, M.A.; Hopstaken, M.J.P.; van der Tak, K.; de Potter de ten Broeck, Muriel; Hooker, J.C.; Meunier-Beillard, P.; Delhougne, R. (2010)