Browsing by author "Noda, T."
Now showing items 1-3 of 3
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Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)
Noda, T.; Eyben, Pierre; Vandervorst, Wilfried; Vrancken, Christa; Rosseel, Erik; Ortolland, Claude; Clarysse, Trudo; Goossens, Jozefien; De Keersgieter, An; Felch, S.; Schreutelkamp, Rob; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Noda, T.; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Vrancken, Christa; Severi, Simone; Hoffmann, Thomas Y.; Falepin, A.; Janssens, Tom; Bender, Hugo; Van Daele, B.; Eyben, Pierre; Niwa, M.; Schreutelkamp, R.; Nouri, F.; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge (2007) -
Two-dimensional carrier profiling with sub-nm resolution using SSRM: from basic concept to TCAD calibration and device tuning
Eyben, Pierre; Vemula, Sri Charan; Noda, T.; Vandervorst, Wilfried (2009)