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Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
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Authors
Noda, T.
;
Vandervorst, Wilfried
;
Felch, S.
;
Parihar, V.
;
Vrancken, Christa
;
Severi, Simone
;
Hoffmann, Thomas Y.
;
Falepin, A.
;
Janssens, Tom
;
Bender, Hugo
;
Van Daele, B.
;
Eyben, Pierre
;
Niwa, M.
;
Schreutelkamp, R.
;
Nouri, F.
;
Absil, Philippe
;
Jurczak, Gosia
;
De Meyer, Kristin
;
Biesemans, Serge
Conference
Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM
Title
Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Publication type
Proceedings paper
Embargo date
9999-12-31
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