Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Publication:
Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Date
2007
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
15832.pdf
491.23 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Noda, T.
;
Vandervorst, Wilfried
;
Felch, S.
;
Parihar, V.
;
Vrancken, Christa
;
Severi, Simone
;
Hoffmann, Thomas Y.
;
Falepin, A.
;
Janssens, Tom
;
Bender, Hugo
;
Van Daele, B.
;
Eyben, Pierre
;
Niwa, M.
;
Schreutelkamp, R.
;
Nouri, F.
;
Absil, Philippe
;
Jurczak, Gosia
;
De Meyer, Kristin
;
Biesemans, Serge
Journal
Abstract
Description
Metrics
Views
1942
since deposited on 2021-10-16
Acq. date: 2025-10-24
Citations
Metrics
Views
1942
since deposited on 2021-10-16
Acq. date: 2025-10-24
Citations