Browsing by author "Enomoto, Masashi"
Now showing items 1-3 of 3
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Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe (2019) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Enomoto, Masashi; Nafus, Kathleen; Demand, Marc; Foubert, Philippe (2017)