Browsing by author "Cremel, Maxime"
Now showing items 1-3 of 3
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Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing
Urbanowicz, Adam; Vanstreels, Kris; Verdonck, Patrick; Shamiryan, Denis; Cremel, Maxime; De Gendt, Stefan; Baklanov, Mikhaïl (2010) -
Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma
Urbanowicz, Adam; Cremel, Maxime; Vanstreels, Kris; Shamiryan, Denis; De Gendt, Stefan; Baklanov, Mikhaïl (2010) -
Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties
Urbanowicz, Adam; Vanstreels, Kris; Verdonck, Patrick; Cremel, Maxime; De Gendt, Stefan; Baklanov, Mikhaïl (2009)