Browsing by author "Langner, Andreas"
Now showing items 1-3 of 3
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EUV resist contrast loss determination using interference lithography
Langner, Andreas; Solak, Harun H.; Auzelyte, Vaida; Ekinci, Yasin; David, Christian; Gobrecht, Jens; Gronheid, Roel; van Setten, Eelco; van Ingen Schenau, Koen; Feenstra, Kees (2009) -
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Langner, Andreas; Ekinci, Yasin; Gronheid, Roel; Wang, Suping; van Setten, Eelco; van Ingen-Schenau, Koen; Feenstra, Kees; Mallmann, Joerg; Maas, Raymond (2010) -
Measuring resist-induced contrast loss using EUV interference lithography
Langner, Andreas; Solak, Harun H.; Gronheid, Roel; van Setten, Eelco; Auzelyte, Vaida; Ekinci, Yasin; van Ingen Schenau, Koen; Feenstra, Kees (2010)