Authors

Langner, Andreas; Ekinci, Yasin; Gronheid, Roel; Wang, Suping; van Setten, Eelco; van Ingen-Schenau, Koen; Feenstra, Kees; Mallmann, Joerg; Maas, Raymond

Conference

International Symposium on Extreme Ultraviolet Lithography

Title

Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography

Publication type

Proceedings paper

Embargo date

9999-12-31