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Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Publication:
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Date
2010
Proceedings Paper
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21615.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Langner, Andreas
;
Ekinci, Yasin
;
Gronheid, Roel
;
Wang, Suping
;
van Setten, Eelco
;
van Ingen-Schenau, Koen
;
Feenstra, Kees
;
Mallmann, Joerg
;
Maas, Raymond
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1869
since deposited on 2021-10-18
Acq. date: 2025-10-24
Citations
Metrics
Views
1869
since deposited on 2021-10-18
Acq. date: 2025-10-24
Citations