Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Publication:
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Copy permalink
Date
2010
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
21615.pdf
2.26 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Langner, Andreas
;
Ekinci, Yasin
;
Gronheid, Roel
;
Wang, Suping
;
van Setten, Eelco
;
van Ingen-Schenau, Koen
;
Feenstra, Kees
;
Mallmann, Joerg
;
Maas, Raymond
Journal
Abstract
Description
Metrics
Views
1872
since deposited on 2021-10-18
Acq. date: 2025-12-09
Citations
Metrics
Views
1872
since deposited on 2021-10-18
Acq. date: 2025-12-09
Citations