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Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography

Date

2010
Proceedings Paper
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dc.contributor.authorLangner, Andreas
dc.contributor.authorEkinci, Yasin
dc.contributor.authorGronheid, Roel
dc.contributor.authorWang, Suping
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorvan Ingen-Schenau, Koen
dc.contributor.authorFeenstra, Kees
dc.contributor.authorMallmann, Joerg
dc.contributor.authorMaas, Raymond
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-18T17:57:20Z
dc.date.available2021-10-18T17:57:20Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17428
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2010
dc.source.conferencelocationKobe Japan
dc.title

Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography

dc.typeProceedings paper
dspace.entity.typePublication
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