Browsing by author "Maloney, Chris"
Now showing items 1-4 of 4
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Feasibility of compensating for EUV field edge effects through OPC
Maloney, Chris; Word, James; Fenger, Germain; Niroomand, Ardavan; Lorusso, Gian; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce (2014) -
Mitigating mask roughness via pupil filtering
Baylav, Burak; Maloney, Chris; Levinson, Zac; Bekaert, Joost; Vaglio Pret, Alessandro; Smith, Bruce (2014) -
Pattern fidelity verification for logic design in EUV lithography
Sugawara, Mino; Hendrickx, Eric; Philipsen, Vicky; Maloney, Chris; Fenger, Germain (2014) -
The impact of pupil plane filtering on mask roughness transfer
Baylav, Burak; Maloney, Chris; Levinson, Zac; Bekaert, Joost; Vaglio Pret, Alessandro; Smith, Bruce W. (2013)