Browsing by author "Hoppe, Wolfgang"

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Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

Gao, Weimin; Wiaux, Vincent; Hoppe, Wolfgang; Philipsen, Vicky; Melvin, Lawrence; Hendrickx, Eric; Lucas, Kevin; Kim, Ryan Ryoung han (2018)