Authors

Gao, Weimin; Wiaux, Vincent; Hoppe, Wolfgang; Philipsen, Vicky; Melvin, Lawrence; Hendrickx, Eric; Lucas, Kevin; Kim, Ryan Ryoung han

Conference

Extreme Ultraviolet (EUV) Lithography IX

Title

Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

Publication type

Proceedings paper

Embargo date

9999-12-31