Now showing items 1-2 of 2

    • Compensation of overlay errors due to mask bending and non-flatness for EUV masks 

      Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009)
    • EUV lithography program at IMEC 

      Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007)