Now showing items 1-4 of 4

    • Application of a new approach to optical proximity correction 

      Rosenbusch, A.; Hourd, A.; Juffermans, Casper; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Vermeulen, Tom; Watson, J.; Ziegler, W.; Zimmerman, R. (1999)
    • New approach to optical proximity correction 

      Rosenbusch, A.; Hourd, A.; Juffermans, C.; Kirsch, H.; Lalanne, F.; Maurer, W.; Romeo, C.; Ronse, Kurt; Schiavone, P.; Simecek, M.; Toublan, O.; Watson, J.; Ziegler, W.; Zimmermann, R. (1998)
    • Status of UV2 Litho project : Usable Vacuum Ultra Violet Lithography 

      Goethals, Mieke; Jonckheere, Rik; Van Roey, Frieda; Hermans, Jan; Van Den Heuvel, Dieter; Eliat, Astrid; Gronheid, Roel; Ronse, Kurt; Wong, P.; Morton, Rob; Vasconi, M.; Severgnini, E.; Henke, W.; Hohle, C.; Henry, D.; Thony, Ph.; Schiavone, P.; Fuard, D. (2003-08)
    • UV2Litho: usable vacuum ultra violet lithography 

      Goethals, Mieke; Jonckheere, Rik; Van Roey, F.; Hermans, J.; Eliat, Astrid; Ronse, Kurt; Wong, P.; Zandbergen, P.; Vasconi, M.; Severgnini, E.; Henke, W.; Hohle, C.; Henry, D.; Thony, P.; Markey, L.; Schiavone, P.; Fuard, D. (2002)