Browsing by author "Hapli, John"
Now showing items 1-4 of 4
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Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Lucas, Kevin; Cork, Christopher M.; Miloslavsky, Alexander; Luk-Pat, Gerard; Barnes, Levi D.; Hapli, John; Lewellen, John; Rollins, Gregoy; Wiaux, Vincent; Verhaegen, Staf (2009) -
Interactions of double patterning technology with wafer processing, OPC and design flows
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf (2008) -
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008) -
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008)