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Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Publication:
Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Date
2009
Journal article
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17430.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lucas, Kevin
;
Cork, Christopher M.
;
Miloslavsky, Alexander
;
Luk-Pat, Gerard
;
Barnes, Levi D.
;
Hapli, John
;
Lewellen, John
;
Rollins, Gregoy
;
Wiaux, Vincent
;
Verhaegen, Staf
Journal
Journal of Micro/Nanolithography, MEMS, and MOEMS
Abstract
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1945
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1945
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations