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Interactions of double patterning technology with wafer processing, OPC and design flows
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Authors
Lucas, Kevin
;
Cork, Chris
;
Miloslavsky, Alex
;
Luk-Pat, Gerry
;
Barnes, Levi
;
Hapli, John
;
Lewellen, John
;
Rollins, Greg
;
Wiaux, Vincent
;
Verhaegen, Staf
Conference
Optical Microlithography XXI
Title
Interactions of double patterning technology with wafer processing, OPC and design flows
Publication type
Proceedings paper
Embargo date
9999-12-31
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