Browsing by author "Kishimura, Shinji"
Now showing items 1-6 of 6
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Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Kim, Hyun-Woo; Delvaux, Christie; Baerts, Christina; Gronheid, Roel; Foubert, Philippe; Kishimura, Shinji; Ercken, Monique (2005) -
Impact of water and top-coats on lithographic performance in 193nm immersion lithography
Kishimura, Shinji; Gronheid, Roel; Ercken, Monique; Maenhoudt, Mireille; Matsuo, Takahiro; Endo, Masayuki; Sasago, Masaru (2005) -
Interactions at the interface between top-coat and resist
Okumura, Haruki; Gronheid, Roel; Nakanishi, Kana; Kishimura, Shinji (2005) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Stepanenko, Nickolay; Kishimura, Shinji; Gronheid, Roel; Maenhoudt, Mireille; Ercken, Monique; Kocsis, Michael; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Benndorf, Michael (2005) -
Study of leaching behavior in immersion lithography by the GSP method
Okumura, Haruki; Man, N.; Kishimura, Shinji; Gronheid, Roel (2005)