Browsing by author "Feenstra, Kees"
Now showing items 1-6 of 6
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
Lorusso, Gian; Davydova, Natalia; Eurlings, Mark; Kaya, Cemil; Peng, Yue; Feenstra, Kees; Fedynyshyn, Theodore H.; Natt, Oliver; Huber, Peter; Zaczek, Christoph; Young, Stuart; Graeupner, Paul; Hendrickx, Eric (2011) -
EUV resist contrast loss determination using interference lithography
Langner, Andreas; Solak, Harun H.; Auzelyte, Vaida; Ekinci, Yasin; David, Christian; Gobrecht, Jens; Gronheid, Roel; van Setten, Eelco; van Ingen Schenau, Koen; Feenstra, Kees (2009) -
Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Langner, Andreas; Ekinci, Yasin; Gronheid, Roel; Wang, Suping; van Setten, Eelco; van Ingen-Schenau, Koen; Feenstra, Kees; Mallmann, Joerg; Maas, Raymond (2010) -
Measuring resist-induced contrast loss using EUV interference lithography
Langner, Andreas; Solak, Harun H.; Gronheid, Roel; van Setten, Eelco; Auzelyte, Vaida; Ekinci, Yasin; van Ingen Schenau, Koen; Feenstra, Kees (2010)