Browsing by author "Miloslavsky, Alex"
Now showing items 1-6 of 6
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Design compliance for Spacer Is Dielectric (SID) patterning
Luk-Pat, Gerard; Miloslavsky, Alex; Painter, Ben; Lin, Li; De Bisschop, Peter; Lucas, Kevin (2012) -
Double patterning OPC and design for 22nm to 16nm device nodes
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Li, Xiaohai; Barnes, Levi; Gao, Weimin; Wiaux, Vincent (2009) -
EDA perspective on manufacturable DPT solutions
Wiaux, Vincent; Gao, Weimin; Lucas, Kevin; Cork, Chris; Luk-Pat, Gerry; Miloslavsky, Alex; Barnes, L.; Painter, B.; Li, X. (2010) -
Interactions of double patterning technology with wafer processing, OPC and design flows
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf (2008) -
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008) -
Physical design and mask synthesis considerations for DPT
Lucas, Kevin; Cork, Chris; Hapli, John; Miloslavsky, Alex; Wiaux, Vincent; Verhaegen, Staf (2008)