Double patterning OPC and design for 22nm to 16nm device nodes

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Authors
Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Li, Xiaohai; Barnes, Levi; Gao, Weimin; Wiaux, Vincent
Conference
6th International Symposium on Immersion Lithography Extensions
Title
Double patterning OPC and design for 22nm to 16nm device nodes
Publication type
Proceedings paper
Embargo date
9999-12-31
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