Browsing by author "Gaillard, F."
Now showing items 1-3 of 3
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A new method for quickly evaluating reversible and permanent components of the BTI degradation
Garros, X.; Subirats, Alexandre; Reimbold, G.; Gaillard, F.; Diouf, C.; Federspiel, X.; Huard, V.; Rafik, M. (2018) -
Characterization and integration of a new Si-O-C film deposited by CVD
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001) -
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Travaly, Youssef; Eyckens, Brenda; Carbonell, Laure; Rothschild, Aude; Le, Quoc Toan; Brongersma, Sywert; Ciofi, Ivan; Struyf, Herbert; Furukawa, Yukiko; Stucchi, Michele; Schaekers, Marc; Bender, Hugo; Rosseel, Erik; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Van Autryve, Luc; Rabinzohn, P. (2002)