Characterization and integration of a new Si-O-C film deposited by CVD

Thumbnail
Metadata
Show full item record
Authors
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc
Conference
Advanced Metallization Conference 2000
Title
Characterization and integration of a new Si-O-C film deposited by CVD
Publication type
Proceedings paper
Collections