Characterization and integration of a new Si-O-C film deposited by CVD

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Author(s)

Alves Donaton, Ricardo

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Struyf, Herbert

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Coenegrachts, Bart

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Stucchi, Michele

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De Roest, David

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Baklanov, Mikhaïl

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Vanhaelemeersch, Serge

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Van Autryve, Luc

Metrics

1933 since deposited on 2021-10-14

Acq. date: 2025-10-23