Publication:

Characterization and integration of a new Si-O-C film deposited by CVD

Date

2001
Proceedings Paper
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dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorStruyf, Herbert
dc.contributor.authorLepage, Muriel
dc.contributor.authorCoenegrachts, Bart
dc.contributor.authorStucchi, Michele
dc.contributor.authorDe Roest, David
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.authorGaillard, F.
dc.contributor.authorXia, L. Q.
dc.contributor.authorLim, T. H.
dc.contributor.authorGotuaco, M.
dc.contributor.authorYieh, E.
dc.contributor.authorVan Autryve, Luc
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-14T16:52:40Z
dc.date.available2021-10-14T16:52:40Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5263
dc.source.beginpage595
dc.source.conferenceAdvanced Metallization Conference 2000
dc.source.conferencedate3/10/2000
dc.source.conferencelocationSan Diego, CA USA
dc.source.endpage601
dc.title

Characterization and integration of a new Si-O-C film deposited by CVD

dc.typeProceedings paper
dspace.entity.typePublication
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